High-precision solvent vapor annealing for block copolymer thin films

Gunnar Nelson, Chloe S. Drapes, Meagan A. Grant, Ryan Gnabasik, Jeffrey Wong, Andrew Baruth

Research output: Contribution to journalArticle

Abstract

Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established. In solvent vapor annealing a thin polymer film is exposed to a vapor of solvent(s) thus forming a swollen and mobile layer to direct the self-assembly process at the nanoscale. Recent developments in both theory and experiments have directly identified critical parameters that govern this process, but controlling them in any systematic way has proven non-trivial. These identified parameters include vapor pressure, solvent concentration in the film, and the solvent evaporation rate. To explore their role, a purpose-built solvent vapor annealing chamber was designed and constructed. The all-metal chamber is designed to be inert to solvent exposure. Computer-controlled, pneumatically actuated valves allow for precision timing in the introduction and withdrawal of solvent vapor from the film. The mass flow controller-regulated inlet, chamber pressure gauges, in situ spectral reflectance-based thickness monitoring, and low flow micrometer relief valve give real-time monitoring and control during the annealing and evaporation phases with unprecedented precision and accuracy. The reliable and repeatable alignment of polylactide cylinders formed from polystyrene-b-polylactide, where cylinders stand perpendicular to the substrate and span the thickness of the film, provides one illustrative example.

Original languageEnglish (US)
Article number271
JournalMicromachines
Volume9
Issue number6
DOIs
StatePublished - May 29 2018

Fingerprint

Block copolymers
Vapors
Annealing
Thin films
Evaporation
Pressure relief valves
Pressure gages
Monitoring
Vapor pressure
Polymer films
Self assembly
Nanostructures
Polystyrenes
Controllers
Substrates
Metals
Experiments

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Nelson, G., Drapes, C. S., Grant, M. A., Gnabasik, R., Wong, J., & Baruth, A. (2018). High-precision solvent vapor annealing for block copolymer thin films. Micromachines, 9(6), [271]. https://doi.org/10.3390/mi9060271

High-precision solvent vapor annealing for block copolymer thin films. / Nelson, Gunnar; Drapes, Chloe S.; Grant, Meagan A.; Gnabasik, Ryan; Wong, Jeffrey; Baruth, Andrew.

In: Micromachines, Vol. 9, No. 6, 271, 29.05.2018.

Research output: Contribution to journalArticle

Nelson, G, Drapes, CS, Grant, MA, Gnabasik, R, Wong, J & Baruth, A 2018, 'High-precision solvent vapor annealing for block copolymer thin films', Micromachines, vol. 9, no. 6, 271. https://doi.org/10.3390/mi9060271
Nelson, Gunnar ; Drapes, Chloe S. ; Grant, Meagan A. ; Gnabasik, Ryan ; Wong, Jeffrey ; Baruth, Andrew. / High-precision solvent vapor annealing for block copolymer thin films. In: Micromachines. 2018 ; Vol. 9, No. 6.
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