Optimization of long-range order in solvent vapor annealed poly(styrene)- block -poly(lactide) thin films for nanolithography

A. Baruth, Myungeun Seo, Chun Hao Lin, Kern Walster, Arjun Shankar, Marc A. Hillmyer, C. Leighton

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

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Chemical Compounds

Engineering & Materials Science